Statistics for Use of PolyEtherEtherKetone (PEEK) containing the antifungal agent nonanoic acid as a denture base material to inhibit Candida albicans colonisation

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Use of PolyEtherEtherKetone (PEEK) containing the antifungal agent nonanoic acid as a denture base material to inhibit Candida albicans colonisation 6

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Academic Transcript-3228065-DENT25-en.pdf 1
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