Epitaxial Growth of Silicon on Poly-Crystalline Si Seed layer at Low Temperature by Using Hot Wire Chemical Vapor Deposition

dc.contributor.advisor	Dr. Hameed Naseem
dc.contributor.author	MANAL ABDULLAH ABDULAZIZ ALDAWSARI
dc.date	2015
dc.date	2016-04-03 13:04:09.490
dc.date.accessioned	2022-06-01T10:55:24Z
dc.date.available	2022-06-01T10:55:24Z
dc.degree.department	Dr. Hameed Naseem
dc.identifier.other	27219
dc.identifier.uri	https://drepo.sdl.edu.sa/handle/20.500.14154/57400
dc.publisher	Saudi Digital Library
dc.title	Epitaxial Growth of Silicon on Poly-Crystalline Si Seed layer at Low Temperature by Using Hot Wire Chemical Vapor Deposition
dc.type	Thesis
sdl.thesis.level	Master
sdl.thesis.source	SACM - United States of America

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